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Hiroshi Kudo
Hiroshi Kudo
Dai Nippon Printing
Electronic engineering
Interposer
Materials science
Optoelectronics
Silicon
9
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34
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Effectiveness of Inorganic Dielectric Layer on Submicron-scale Cu Traces against Thermal Oxidative Stress
2021
ECTC | Electronic Components and Technology Conference
Hiroshi Kudo
Takamasa Takano
Kouji Sakamoto
Daisuke Kitayama
Haruo Iida
Masaya Tanaka
Takahiro Tai
Yumi Okazaki
Jyunya Suzuki
Shinji Maekawa
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Introduction of Sub-2-micron Cu traces to EnCoRe enhanced copper redistribution layers for heterogeneous chip integration
2018
ICEP | International Conference on Electronics Packaging
Hiroshi Kudo
Yuuki Aritsuka
Tanaka Masaya
Ryohei Kasai
Jyunichi Suyama
Mitsuhiro Takeda
Yumi Okazaki
Haruo Iida
Daisuke Kitayama
Kouji Sakamoto
Takamasa Takano
Miyuki Akazawa
Hiroaki Sato
Shouhei Yamada
Satoru Kuramochi
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Demonstration of high electromigration resistance of enhanced sub-2 micron-scale Cu redistribution layer for advanced fine-pitch packaging
2017
ICSJ | CPMT Symposium Japan
Hiroshi Kudo
Ryohei Kasai
Jyunichi Suyama
Mitsuhiro Takeda
Yumi Okazaki
Haruo Iida
Daisuke Kitayama
Kouji Sakamoto
Hiroaki Sato
Shouhei Yamada
Miyuki Akazawa
Satoru Kuramochi
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Citations (8)
Glass interposer for advanced packaging solution
2016
Electronics System-integration Technology Conference
Satoru Kuramochi
Hiroshi Kudo
Miyuki Akazawa
Hiroshi Mawatari
Masaya Tanaka
Yoshitaka Fukuoka
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A Characterized Redistribution Layer Architecture for Advanced Packaging Technologies
2016
ECTC | Electronic Components and Technology Conference
Hiroshi Kudo
Takamasa Takano
Masaya Tanaka
Ryohhei Kasai
Jyunichi Suyama
Miyuki Akazawa
Mitsuhiro Takeda
Hiroshi Mawatari
Toshio Sasao
Yumi Okazaki
Naoki Oota
Susumu Tashiro
Haruo Iida
Kouji Sakamoto
Hiroyuki Sato
Daisuke Kitayama
Shouhei Yamada
Satoru Kuramochi
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Citations (5)
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