A Characterized Redistribution Layer Architecture for Advanced Packaging Technologies

An enhanced redistribution layer architecture has been developed in which the Cu wires are directly covered with a double layer consisting of two types of dielectrics by using a semi-additive process. The double layer enhanced the thermal and electrical reliabilities of the Cu wires. Moreover, it enabled fabrication of a single-sided nine-level redistribution layer embedded with a fully stacked via. This greatly increased wiring layout flexibility and enhanced the transmission rate. Characterization of this architecture revealed that it has several advantages for advanced packaging technologies including a 2.5D interposer.