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Tokihisa Kaneguchi
Tokihisa Kaneguchi
Sony Broadcast & Professional Research Laboratories
Lithography
Materials science
Photolithography
Resist
Optoelectronics
3
Papers
2
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Effect of azimuthally polarized illumination imaging on device patterns beyond 45nm node
2006
Ken Ozawa
Boontarika Thunnakart
Tokihisa Kaneguchi
Isao Mita
Atsushi Someya
Toshiharu Nakashima
Hisashi Nishinaga
Yasushi Mizuno
Tomoyuki Matsuyama
Masato Hamatani
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A new criterion of mask birefringence for polarized illumination
2006
Kazuya Iwase
Boontarika Thunnakart
Tokihisa Kaneguchi
Ken Ozawa
Toshifumi Yokoyama
Yasutaka Morikawa
Fumikatsu Uesawa
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Robust lithography process control methodology anticipating CD after etching using scatterometry below 65nm node
2005
Tokihisa Kaneguchi
Atsushi Someya
Hiroichi Kawahira
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