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Boontarika Thunnakart
Boontarika Thunnakart
Sony Broadcast & Professional Research Laboratories
Materials science
Optics
Optoelectronics
Lithography
Silicon nitride
4
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4
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Effect of azimuthally polarized illumination imaging on device patterns beyond 45nm node
2006
Ken Ozawa
Boontarika Thunnakart
Tokihisa Kaneguchi
Isao Mita
Atsushi Someya
Toshiharu Nakashima
Hisashi Nishinaga
Yasushi Mizuno
Tomoyuki Matsuyama
Masato Hamatani
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Optimization of dual BARC structures for hyper-NA immersion lithography
2006
Nobuyuki Matsuzawa
Boontarika Thunnakart
Ken Ozawa
Yuko Yamaguchi
Hiroyuki Nakano
Hiroichi Kawahira
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Optimization of Dual-BARC Structures on Silicon Oxide and Nitride Layers to be Used for Hyper NA Immersion Lithography
2006
Journal of Photopolymer Science and Technology
Nobuyuki Matsuzawa
Boontarika Thunnakart
Ken Ozawa
Yuko Yamaguchi
Hiroyuki Nakano
Hiroichi Kawahira
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A new criterion of mask birefringence for polarized illumination
2006
Kazuya Iwase
Boontarika Thunnakart
Tokihisa Kaneguchi
Ken Ozawa
Toshifumi Yokoyama
Yasutaka Morikawa
Fumikatsu Uesawa
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