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M. Rothwell
M. Rothwell
IBM
Ashing
Dielectric
Ion
Analytical chemistry
Chemistry
2
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29
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Effect of radical species density and ion bombardment during ashing of extreme ultralow-κ interlevel dielectric materials
2007
Journal of Applied Physics
Marcus A. Worsley
Stacey F. Bent
Nicholas C. M. Fuller
T.L. Tai
James P. Doyle
M. Rothwell
Timothy J. Dalton
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Citations (29)
Effect of Species Density and Ion Scattering During Ashing on Ultra Low-$\kappa $ Inter-Level Dielectric Films
2005
Bulletin of the American Physical Society
Worsley
Stacey F. Bent
Nicholas C. M. Fuller
T.L. Tai
James P. Doyle
M. Rothwell
Timothy J. Dalton
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