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Peter A. Rosenthal

Philips

6

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18

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Model‐Based Infrared Metrology for Advanced Technology Nodes and 300 mm Wafer Processing

2005 Characterization and Metrology for ULSI Technology
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FTIR Measurements of Thickness and Free Carrier Concentration in GaN‐Based Films

2003 Physica Status Solidi (c)
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Advanced FTIR technology for the chemical characterization of product wafers

2001 Characterization and Metrology for ULSI Technology
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EXHAUST GAS MONITORING : NEW WINDOW INTO SEMICONDUCTOR PROCESSING

1999 Solid State Technology
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Infrared spectroscopy for process control and fault detection of advanced semiconductor processes

1998 Characterization and Metrology for ULSI Technology
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Citations (2)