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Brian Ashe
Brian Ashe
IBM
Electron-beam lithography
Resist
Materials science
Nanotechnology
high resolution
2
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1
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0
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Use of KRS-XE positive chemically amplified resist for optical mask manufacturing
2002
Brian Ashe
Christina Deverich
Paul A. Rabidoux
Barbara Bates Peck
Karen Petrillo
Marie Angelopoulos
Wu-Song Huang
Wayne M. Moreau
David R. Medeiros
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Extending the performance of KRS-XE for high-throughput electron-beam lithography for advanced mask making
2002
David R. Medeiros
Karen Petrillo
James J. Bucchignano
Marie Angelopoulos
Wu-Song Huang
Wenjie Li
Wayne M. Moreau
Robert Lang
Ranee W. Kwong
Christopher Magg
Brian Ashe
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