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M. Hatanaka
M. Hatanaka
Fujitsu
Chemical vapor deposition
Dielectric
Plasma
Plasma-enhanced chemical vapor deposition
Electrode
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H/sub 2/O-TEOS plasma-CVD realizing dielectrics having a smooth surface
1991
VLSI-MIC | International IEEE VLSI Multilevel Interconnection Conference
M. Hatanaka
Y. Mizushima
O. Hataishi
Y. Furumura
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