author-photo

Atsushi Kajikura

5

Papers

0

Citations

Citation Trend

Filter By

Papers (4) Sort By

Journal Conference Others

Development of a wide variety of half-inch wafers that can be used in Minimal Fab

2021 The Japan Society of Applied Physics
Show All
- Source
- Cite
- Save
Citations (0)
Fabrication of Vertical Schottky Barrier Diodes on β-Ga 2 O 3 Substrates Prepared by Vertical Bridgman Method

2020 The Japan Society of Applied Physics
Show All
- Source
- Cite
- Save
Citations (0)
Half-inch Wafers for New Materials Processing Model

2017 The Japan Society of Applied Physics
Show All
- Source
- Cite
- Save
Citations (0)
Development of the Polishing System for High-Speed & High-Pressure Polishing Process: -Application and polishing characteristics of the Sapphire and SiC substrates -@@@－サファイヤならびに SiC 基板への適用とその加工特性－

2016
Show All
- Source
- Cite
- Save
Citations (0)