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Dong-Hyuk Lee
Dong-Hyuk Lee
Photronics, Inc.
Optics
Chemistry
Analytical chemistry
Volumetric flow rate
Etching
3
Papers
1
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0
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The judgment criteria of halftone pinhole defects
2004
Kyong Mun Shin
Dae-Woo Kim
Jung-Kwan Lee
Dong-Hyuk Lee
Jin-Min Kim
Sang-Soo Choi
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Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures
2002
Se-Jong Choi
Han Sun Cha
Si-Yeul Yoon
Yong-Dae Kim
Dong-Hyuk Lee
Jin-Min Kim
Jin-Su Kim
Dong-Soo Min
Pil-Jin Jang
Byung-Soo Chang
Hyuk-Joo Kwon
Boo-Yeon Choi
Sang-Soo Choi
Soo Hong Jeong
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Etching selectivity and surface profile of attenuated phase shifting mask using CF4/O2/He inductively coupled plasma (ICP)
2002
Si Yeul Yoon
Se-Jong Choi
Young-Dae Kim
Dong-Hyuk Lee
Han Sun Cha
Jin-Min Kim
Sang-Soo Choi
Soo Hong Jeong
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