Old Web
English
Sign In
Acemap
>
authorDetail
>
Byung-Soo Chang
Byung-Soo Chang
Photronics, Inc.
Dry etching
Materials science
Etching
Analytical chemistry
Photomask
9
Papers
8
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (5)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Characteristics of Selective MoSiON Etching in a Chlorine Plasma
2002
Byung-Soo Chang
Dong-Soo Min
Hyuk-Joo Kwon
Boo-Yeon Choi
Show All
Source
Cite
Save
Citations (0)
Higher Anisotropy and Improved Surface Conditions for 90nm Node MoSiON ICP Dry Etch
2002
Dong-Soo Min
Byung-Soo Chang
Hyuk-Joo Kwon
Boo-Yeon Choi
Show All
Source
Cite
Save
Citations (0)
Loading effect parameters of dry etcher system and their analysis in mask-to-mask loading and within-mask loading
2002
Hyuk-Joo Kwon
Dong-Soo Min
Pil-Jin Jang
Byung-Soo Chang
Boo-Yeon Choi
Soo Hong Jeong
Show All
Source
Cite
Save
Citations (1)
Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures
2002
Se-Jong Choi
Han Sun Cha
Si-Yeul Yoon
Yong-Dae Kim
Dong-Hyuk Lee
Jin-Min Kim
Jin-Su Kim
Dong-Soo Min
Pil-Jin Jang
Byung-Soo Chang
Hyuk-Joo Kwon
Boo-Yeon Choi
Sang-Soo Choi
Soo Hong Jeong
Show All
Source
Cite
Save
Citations (0)
Dry etching of Cr layer and its loading effect
2001
Hyuk-Joo Kwon
Dong-Soo Min
Pil-Jin Jang
Byung-Soo Chang
Boo-Yeon Choi
Kyung-Ho Park
Soo-Hong Jeong
Show All
Source
Cite
Save
Citations (3)
1