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Jun Yuan
Jun Yuan
IBM
Materials science
Optoelectronics
Analytical chemistry
Electron holography
Semiconductor
5
Papers
7
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Carbon implantation to adjust the work function at a replacement gate transistor
2012
Dechao Guo
Shu-Jen Han
Keith Kwong Hon Wong
Jun Yuan
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Suppression of boron diffusion in deep submicron devices
2011
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
M. Gribelyuk
Phil Oldiges
P. Ronsheim
Jun Yuan
Leon Kimball
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Citations (6)
Application of Electron Holography to Semiconductor Structures and Devices
2010
Microscopy and Microanalysis
M. Gribelyuk
V. Ontalus
Kathryn T. Schonenberg
Jun Yuan
Tn Adam
P. Ronsheim
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Blanket SMT With In Situ N2 Plasma Treatment on the $\langle \hbox{100} \rangle$ Wafer for the Low-Cost Low-Power Technology Application
2009
IEEE Electron Device Letters
Jun Yuan
Victor Chan
Nivo Rovedo
Viraj Y. Sardesai
Narasimhulu Kanike
V. Varadarajan
M. Yu
Jong-Ho Yang
Y.K. Jeong
O.S. Kwon
Michael P. Belyansky
M. Eller
Yong Meng Lee
N. Cave
Huiling Shang
Y. Li
Ramachandra Divakaruni
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Electron holography for 2-D dopant profiling
2009
IWJT | International Workshop on Junction Technology
M. Gribelyuk
Jun Yuan
Oleg Gluschenkov
P. Ronsheim
Huiling Shang
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