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Susumu Aiuchi
Susumu Aiuchi
Hitachi
Materials science
Analytical chemistry
Optoelectronics
Substrate (chemistry)
Plasma processing
7
Papers
10
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0
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Dry Etching Endpoint Monitor by Scribe-Line Detection Method
1988
Shinku
Takashi Kamimura
Tooru Ootsubo
Susumu Aiuchi
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Verfahren und Vorrichtung zur Zerstäubung
1984
Hiroshi Saito
Hideki Tateishi
Shigeru Kobayashi
Susumu Aiuchi
Yasumichi Suzuki
Masao Sakata
Hideaki Shimamura
Tsuneaki Kamei
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Planar magnetron sputtering cathode with deposition rate distribution controllability
1982
Thin Solid Films
Katsuo Abe
Shigeru Kobayashi
Tsuneaki Kamel
Tamotsu Shimizu
Hideki Tateishi
Susumu Aiuchi
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Exposure device and method for exposing a substrate of a belichtungsflaeche and copy a predetermined pattern to this
1981
Nobuyuki Akiyama
Yukio Kembo
Yasuo Nakagawa
Susumu Aiuchi
Mineo Nomoto
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