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Tetsuya Igo
Tetsuya Igo
Materials science
Ion implantation
Silicon
Analytical chemistry
Limiting oxygen concentration
3
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1
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A novel approach for highly activated p + diffusion layer formation in germanium by pre-heating oxygen desorption before ion implantation
2017
IWJT | International Workshop on Junction Technology
Tetsuya Igo
Takahiro Higuchi
Tsutomu Nagayama
T. Kuroi
Nariaki Hamamoto
Hideaki Tanimura
Hikaru Kawarazaki
Takayuki Aoyama
Shinichi Kato
Ippei Kobayashi
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High Current Ion Implanter "LUXiON"
2016
Yusuke Kuwata
Tetsuya Igo
Kohei Tanaka
Sami K. Hahto
Tetsuro Yamamoto
H. Une
Hirofumi Asai
Masayoshi Hino
Sei Umisedo
Karuppanan Sekar
Thormas N. Horsky
Yoshiki Nakashima
Nariaki Hamamoto
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Cluster Carbon ion implantation for NMOS device fabrication improvements
2010
ICSICT | IEEE International Conference on Solid-State and Integrated Circuit Technology
Masayasu Tanjyo
H Onoda
Tsutomu Nagayama
Nariaki Hamamoto
Sei Umisedo
Yuji Koga
H. Une
Noriaki Maehara
Yasunori Kawamura
Y. Hashino
Yoshiki Nakashima
Tetsuya Igo
Masahiro Hashimoto
Nobuhiro Tokoro
Nobuo Nagai
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