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H. Tan
H. Tan
University of Toulouse
Passivation
Deposition (law)
Ellipsometry
Germanium
Electron diffraction
2
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2
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0
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Atomic-layer deposited thulium oxide as a passivation layer on germanium
2015
Journal of Applied Physics
I. Z. Mitrovic
S. Hall
M. Althobaiti
David Hesp
V.R. Dhanak
A. Santoni
Ayendra Weerakkody
Naser Sedghi
Paul R. Chalker
Christoph Henkel
E. Dentoni Litta
Per-Erik Hellström
Mikael Östling
H. Tan
Sylvie Schamm-Chardon
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MS-3-P-5702 Nanoanalytical investigations at the interface of 4H-SiC/SiO2 MOSFETs [Póster]
2014
H. Tan
Ana M. Beltrán
K. March
Vincent Mortet
Eléna Bedel-Pereira
F. Cristiano
Christian Strenger
Anton J. Bauer
Sylvie Schamm-Chardon
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