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Doug C. Heiderman
Doug C. Heiderman
Nanotechnology
Dopant
Ionization
Implant
Beam (structure)
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UpTime® Si2H6/SiF4 Mix for High Productivity Si Implant
2016
Ashwini K. Sinha
Doug C. Heiderman
Robin Chiu
Bon-Woong Koo
David Sporleder
Stanley M. Smith
Frank Sinclair
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