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Michael Belisle
Michael Belisle
Applied Materials
Oxide
Nanotechnology
Coating
Photolithography
Photoresist
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Advanced processes for photomask damage-free cleaning and photoresist removal
2006
James S. Papanu
Roman Gouk
Han Wen Chen
Pieter Boelen
Phillip Peters
Michael Belisle
Steven Verhaverbeke
Alexander Sou-Kang Ko
Kent Child
Elias Martinez
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