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Kent Child
Kent Child
Applied Materials
Materials science
Nanotechnology
Photolithography
Photoresist
Stripping (chemistry)
3
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3
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0
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High Efficiency Wafer Backside Cleaning with Full Coverage Megasonics Spin Process
2007
Bo Xie
Sung Won Park
Jung Ho Han
Z Fred Li
Roman Gouk
Wei Lu
Chung H. Jeon
Ven Subbaraman
Kent Child
Jason Wright
James S. Papanu
Jianshe Tang
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Advanced processes for photomask damage-free cleaning and photoresist removal
2006
James S. Papanu
Roman Gouk
Han Wen Chen
Pieter Boelen
Phillip Peters
Michael Belisle
Steven Verhaverbeke
Alexander Sou-Kang Ko
Kent Child
Elias Martinez
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Advanced mask cleaning techniques for sub-100-nm technology nodes
2005
James S. Papanu
Roman Gouk
Cole Franklin
Han Wen Chen
Steven Verhaverbeke
Alexander Sou-Kang Ko
Kent Child
Pieter Boelen
Suresh Shrauti
Elias Martinez
Brian J. Brown
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Citations (2)
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