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Vlad Liubich
Vlad Liubich
Siemens
Lithography
Mask data preparation
Computer science
Photomask
Algorithm
2
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2024
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Curvature based fragmentation for curvilinear mask process correction
2021
Ingo Bork
Peter Buck
Bhardwaj Durvasula
Vlad Liubich
Nageswara Rao
Rachit Sharma
Mary Zuo
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Rapid full-chip curvilinear OPC for advanced logic and memory
2021
Vlad Liubich
Keisuke Mizuuchi
Alexander Tritchkov
Ashutosh Rathi
Xima Zhang
Isabella Kim
John L. Sturtevant
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