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W.S. Jung
W.S. Jung
Samsung
Optoelectronics
Plasma
Sputtering
Aspect ratio (aeronautics)
Physics
2
Papers
3
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Optical Interface for Digital Display
1999
H.K. Shin
W.S. Jung
B. S. Kim
S.I. Lee
I. I. Kim
E. Y. Yun
Y. Joung
M. Y. Yoon
B. C. Koh
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A novel Al-reflow process using surface modification by the ECR plasma treatment and its application to the 256 Mbit DRAM
1994
IEDM | International Electron Devices Meeting
In Seon Park
S.I. Lee
Young Jin Wee
W.S. Jung
Gil-heyun Choi
Chang-soo Park
Soon-yeon Park
S.T. Ahn
Myoung-Bum Lee
Y. K. Kim
R. Reynolds
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Citations (2)
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