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Hiroshi Nohira
Hiroshi Nohira
Katholieke Universiteit Leuven
Materials science
Analytical chemistry
Chemical vapor deposition
Thin film
X-ray photoelectron spectroscopy
6
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174
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TOF-SIMS as a rapid diagnostic tool to monitor the growth mode of thin (high k) films
2003
Applied Surface Science
Thierry Conard
Wilfried Vandervorst
Jasmine Petry
Chao Zhao
W.F.A. Besling
Hiroshi Nohira
Olivier Richard
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Citations (15)
Characterization of ALCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy
2002
Journal of Non-crystalline Solids
Hiroshi Nohira
W. Tsai
W. Besling
E Young
Jasmine Petry
T. Conard
Wilfried Vandervorst
S. De Gendt
M. Heyns
J. W. Maes
Marko Tuominen
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Citations (111)
Infrared interface analysis of high-k dielectrics deposited by atomic layer chemical vapour deposition
2001
V. Cosnier
Hugo Bender
A. Caymax
J. Chen
T. Conard
Hiroshi Nohira
O. Richard
W. Tsai
Wilfried Vandervorst
E. Young
Chao Zhao
S. De Gendt
A. Heyns
J. W. Maes
Marko Tuominen
N. Rochat
M. Olivier
A. Chabli
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Citations (1)
TOFSIMS as a monitor for thin film growth
2001
Thierry Conard
Wilfried Vandervorst
Jasmine Petry
Chao Zhao
W.F.A. Besling
Hiroshi Nohira
Olivier Richard
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