Old Web
English
Sign In
Acemap
>
authorDetail
>
P. Martin
P. Martin
Varian Semiconductor
Ion implantation
Electronic engineering
MOSFET
Doping
Engineering
2
Papers
16
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (2)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Improved sidewall doping of extensions by AsH 3 ion assisted deposition and doping (IADD) with small implant angle for scaled NMOS Si bulk FinFETs
2013
IEDM | International Electron Devices Meeting
Yuichiro Sasaki
Ludovic Godet
T. Chiarella
David Paul Brunco
Tyler Rockwell
Jae Woo Lee
Benjamin Colombeau
Mitsuhiro Togo
Soon Aik Chew
G. Zschaetszch
K. B. Noh
A. De Keersgieter
Guillaume Boccardi
Min-Soo Kim
Geert Hellings
P. Martin
Wilfried Vandervorst
Aaron Thean
Naoto Horiguchi
Show All
Source
Cite
Save
Citations (9)
Heated implantation with amorphous Carbon CMOS mask for scaled FinFETs
2013
VLSIT | Symposium on VLSI Technology
Mitsuhiro Togo
Yuichiro Sasaki
G. Zschätzsch
Guillaume Boccardi
Romain Ritzenthaler
Jae Woo Lee
F. Khaja
B. Colombeau
Ludovic Godet
P. Martin
S. Brus
S. E. Altamirano
G. Mannaert
Harold Dekkers
Geert Hellings
Naoto Horiguchi
Wilfried Vandervorst
Aaron Thean
Show All
Source
Cite
Save
Citations (7)
1