Improved sidewall doping of extensions by AsH 3 ion assisted deposition and doping (IADD) with small implant angle for scaled NMOS Si bulk FinFETs

We demonstrate a novel photoresist-compatible FinFET doping technique that combines the advantages of deposition and implantation. Energy and deposition thickness optimization for the Ion Assisted Deposition and Doping (IADD) process provides excellent doping of nMOS extensions, thus reducing external resistance R EXT . On current I ON is improved by 6-8% for L G of 26-30 nm and by 15% for L G of 20 nm, with better SCE and DIBL.