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Laura M. Matz
Laura M. Matz
Air Products & Chemicals
Materials science
Dielectric
Chemistry
Plasma-enhanced chemical vapor deposition
Composite material
7
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29
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Composition de nettoyage de photorésine utilisée en photolithographie et procédé de traitement de substrat avec celle-ci
2016
Randy Li-Kai Chang
Gene Everad Parris
Hsiu Mei Chen
Yi-Chia Lee
Wen Dar Liu
Tianniu Chen
Laura M. Matz
Ryback Li Chang Lo
Ling-Jen Meng
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Silicon precursor development for advanced dielectric barriers for VLSI technology
2012
Microelectronic Engineering
Anupama Mallikarjunan
Andrew David Johnson
Laura M. Matz
Raymond Nicholas Vrtis
Agnes Derecskei-Kovacs
Xuezhong Jiang
Manchao Xiao
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Procédés de formation de couches minces de titanate de strontium
2010
Laura M. Matz
Xiangxin Rui
Xinjian Lei
Sunil Shanker
Moo-Sung Kim
Nobi Fuchigami
Iain Buchanan
Anh Duong
Sandra G. Malhotra
Imran Hashim
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Porous low k structural design to meet next generation interconnect needs
2010
IITC | International Interconnect Technology Conference
Laura M. Matz
Mary Kathryn Haas
Raymond Nicholas Vrtis
Xuezhong Jiang
Aiping Wu
Madhukar Bhaskara Rao
Mark Leonard O'neill
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Impact of CMP Polish and pCMP Cleaning on Adhesion of SiCN Capping Layer on PECVD-Derived Porous OSG and Copper
2009
Solid State Phenomena
Dave M. Gage
A.D.W. Thiel
Reinhold H. Dauskardt
Mary Kathryn Haas
Laura M. Matz
Mark Leonard O'neill
T.M. Wieder
G. Banerjee
Madhukar Bhaskara Rao
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