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Ronny Walter
Ronny Walter
Extreme ultraviolet lithography
Optics
Metrology
Dry etching
Optoelectronics
4
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10
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EUVL mask blanks: Recent results on substrates, multilayers and the dry-etch process of TaN-absorbers
2006
Holger Seitz
Markus Renno
Thomas Leutbecher
Nathalie Olschewski
Torsten Reichardt
Ronny Walter
Helmut Popp
Günter Hess
Florian Letzkus
Jörg Butschke
Mathias Irmscher
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Citations (3)
Recent results on EUV mask blank multilayers and absorbers
2005
Holger Seitz
Frank Sobel
Markus Renno
Thomas Leutbecher
Nathalie Olschewski
Thorsten Reichardt
Ronny Walter
Hans Becker
Ute Buttgereit
Guenter Hess
Konrad Knapp
Christian Wies
Rainer Lebert
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Citations (4)
High speed reflectometer for EUV mask-blanks
2005
Christian Wies
Rainer Lebert
Bernhard Jagle
Larissa Juschkin
Frank Sobel
Holger Seitz
Ronny Walter
C. Laubis
Frank Scholze
W. Biel
O. Steffens
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Citations (1)
Production challenges of making EUV mask blanks
2004
Holger Seitz
Frank Sobel
Markus Renno
Thomas Leutbecher
Nathalie Olschewski
Thorsten Reichardt
Ronny Walter
Hans Becker
Ute Buttgereit
Günter Hess
Konrad Knapp
Christian Wies
Rainer Lebert
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Citations (2)
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