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Richard C. Guarnieri
Richard C. Guarnieri
Electron-beam lithography
Nanotechnology
Metallurgy
Materials science
Next-generation lithography
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A New High Performance CA Resist for E-beam Lithography
1999
MRS Proceedings
Ranee Kwong
Wu-Song Huang
Wayne M. Moreau
Robert Lang
Christopher F. Robinson
David R. Medeiros
Ari Aviram
Richard C. Guarnieri
Marie Angelopoulos
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