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Guen Su Lee

SEMATECH

8

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Imaging and photochemistry studies of fluoropolymers for 193-nm lithography

2003
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Negative photoresist for 157-nm microlithography: a progress report

2003
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Negative photoresist for 157 nm microlithography; A progress report

2002
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Negative photoresist for 157 nm microlithography: A progress report

2002
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Citations (3)