Imaging and photochemistry studies of fluoropolymers for 193-nm lithography

The authors have studied the impact of absorbance on the overall process window. The chemical contrast has been monitored by FTIR to understand the overall effect of absorbance through careful modulation of absorbing additives 193nm. The effects of absorbance and contrast has been simulated and through experimentation confirmed. The authors will provide comprehensive details of the synthesis of polymers, additives and impact on 157nm lithography.