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Shahar Gov

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CD metrology for EUV lithography and etch

2015 ASMC | Advanced Semiconductor Manufacturing Conference
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Usage of overlay metrology simulator in design of overlay metrology tools for the 65-nm node and beyond

2004
- Yariv Simovitch
- Shahar Gov
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Mesures optiques de structures a motifs

2003
- Boaz Brill
- Shahar Gov
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