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Geum‐Joo Ra
Geum‐Joo Ra
Axcelis Technologies
Ion implantation
Materials science
Electronic engineering
Optoelectronics
Wafer
5
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3
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0
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Improved Re‐Crystallization of p+ Poly‐Si Gates with Molecular Ion Implantation
2008
Jin‐Ku Lee
Min-Ae Ju
Jae-Geun Oh
Sun‐Hwan Hwang
Seung-Joon Jeon
Ja-Chun Ku
Sungki Park
Kyung-Won Lee
Steve Kim
Geum‐Joo Ra
Ron Reece
Leonard Rubin
W. Krull
Hyun-Seok Cho
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Investigation of wafer temperature effect during implant for PMOS transistor fabrication
2008
IWJT | International Workshop on Junction Technology
Tae‐Hoon Huh
Byung‐Jae Kang
Geum‐Joo Ra
Shin-Woo Kang
Steve Kim
Ron Reece
Leonard Rubin
Min‐Sung Lee
Jong-Oh Lee
Dong-Chul Park
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A Study of Implanted BF2 as a Function of Wafer Temperature During Implant
2008
Tae‐Hoon Huh
Byung‐Jae Kang
Geum‐Joo Ra
Kyung-Won Lee
Steve Kim
Ronald N. Reece
Leonard Rubin
Michael S. Ameen
Won‐Min Moon
Min‐Sung Lee
Young‐Ho Lee
Jong-Oh Lee
Dong-Chul Park
Jung‐Youn Lim
Youn‐Soo Kim
Jae-Sang Ro
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A Study of Carbon Effects in Implantation Process for Non‐Silicide Contact Formation
2006
T. H. Huh
S. Kim
Geum‐Joo Ra
R.N. Reece
S. I. Kondratenko
Y. S. Kim
K. I. Shin
W. H. Jeon
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Channeling effects and quad chain implantation process optimization for low energy boron ions
2002
Serguei Kondratenko
Ronald N. Reece
Geum‐Joo Ra
Sinarman Salam
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