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Yoshinori Shohmitsu
Yoshinori Shohmitsu
Japan Aerospace Exploration Agency
Materials science
Optics
Silicon
Deep reactive-ion etching
Thin film
5
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1
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0
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Anomalous Ag diffusion in phase change materials – from nanowire formation to γ-ray detection –
2021
The Japan Society of Applied Physics
Toshihiro Nakaoka
Tatsuya Watanabe
Hyoseong Park
Kazuki Nakaya
Isao Yoda
Yoshinori Shohmitsu
Shigeo Kawasaki
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Fabrication of three-layer silicon antireflection structures in200–450 GHz using deep reactive ion etching
2021
Applied Optics
Takashi Hasebe
Tasuku Hayashi
Yoshinori Shohmitsu
Tom Nitta
Hiroshi Matsuo
Yutato Sekimoto
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Reversible and irreversible resistance changes for gamma-ray irradiation in silver-diffused germanium telluride
2020
Hyoseong Park
Tatsuya Watanabe
Isao Yoda
Yoshinori Shohmitsu
Shigeo Kawasaki
Toshihiro Nakaoka
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Development of Multi-Layer Anti-Reflection Structures for Millimeter-Wave Silicon Optics Using Deep Reactive Ion Etching Process
2019
Journal of Low Temperature Physics
T. Hasebe
T. Hayashi
Hayato Takakura
Yutaro Sekimoto
Kumi Ishikawa
Yoshinori Shohmitsu
Kazuhusa Noda
Satoshi Saeki
Yuichiro Ezoe
Tom Nitta
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Cyclic voltammetry and effect of gamma-ray irradiation in GeTe thin films
2019
The Japan Society of Applied Physics
Tatsuya Watanabe
Hyoseong Park
Isao Yoda
Yoshinori Shohmitsu
Shigeo Kawasaki
Toshihiro Nakaoka
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