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Alex Buxbaum
Alex Buxbaum
Applied Materials
Photomask
Dry etching
Engineering
Nanotechnology
Photoresist
6
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6
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DUV ALTA system aerial image enhancement for improved pattern fidelity
2003
Paul C. Allen
Alex Buxbaum
Samuel C. Howells
Boaz Kenan
Asher Klatchko
Peter Pirogovsky
Robin Teitzel
Michael White
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Extended chamber matching and repeatability study for chrome etch
2002
Yi-Chiau Huang
Melisa J. Buie
Brigitte C. Stoehr
Alex Buxbaum
Guenther Ruhl
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Characterization of an integrated multibeam laser mask-pattern generation and dry etch processing total solution
2002
Alex Buxbaum
Melisa J. Buie
Brigitte C. Stoehr
Warren Montgomery
Scott E. Fuller
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Photolithographic evaluation of deep UV resist materials for mask-making applications
2001
Warren Montgomery
Alex Buxbaum
William Rodrigues
Jeff A. Albelo
Scott E. Fuller
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