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Youngkyun Kweon

Hanyang University

Analytical chemistry
Thin film
Plasma
Inorganic chemistry
Atomic layer deposition

3

Papers

11

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Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer

2018 Journal of Vacuum Science and Technology
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Citations (4)
Effect of adding an insulator between metal and semiconductor layers on contact resistance

2018 Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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