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Chanwon Jung

Hanyang University

5

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Characteristics of carbon-containing low-k dielectric SiCN thin films deposited via remote plasma atomic layer deposition

2021 Journal of Vacuum Science and Technology
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Carbon content control of silicon oxycarbide film with methane containing plasma

2020 Journal of Vacuum Science and Technology
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Postdeposition annealing on VO2 films for resistive random-access memory selection devices

2018 Journal of Vacuum Science and Technology
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Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer

2018 Journal of Vacuum Science and Technology
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