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Fusmio Murai
Fusmio Murai
Chemistry
Lithography
Bilayer
Spin-½
Resist
1
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30
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Spin‐Coatable Inorganic Resists Based on Novel Peroxopolyniobotungstic Acids for Bilayer Lithography
1987
Journal of The Electrochemical Society
Tetsuichi Kudo
Akira Ishikawa
Hiroshi Okamoto
Katsuki Miyauchi
Fusmio Murai
Kozo Mochiji
Hiroshi Umezaki
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