Old Web
English
Sign In
Acemap
>
authorDetail
>
Joo-Won Lee
Joo-Won Lee
Samsung
Atomic layer deposition
Substrate (chemistry)
Silicon
Electronic engineering
Optoelectronics
4
Papers
20
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (4)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Ultimate solution for low thermal budget gate spacer and etch stopper to retard short channel effect in sub-90 nm devices
2003
VLSIT | Symposium on VLSI Technology
Jong-Ho Yang
Jae-Eun Park
Joo-Won Lee
Kang-soo Chu
Ja-hum Ku
Moon Han Park
Nae-in Lee
Hee Sung Kang
Myung Hwan Oh
Jun Ha Lee
Ho Kyu Kang
Kwang Pyuk Suh
Show All
Source
Cite
Save
Citations (9)
Mass-productive ultra-low temperature ALD SiO/sub 2/ process promising for sub-90 nm memory and logic devices
2002
IEDM | International Electron Devices Meeting
Jae-Eun Park
Ja-hum Ku
Joo-Won Lee
Jong-Ho Yang
Kang-soo Chu
Seung-Hwan Lee
Moon Han Park
Nae-in Lee
Ho Kyu Kang
Kwang Pyuk Suh
Byoung Ha Cho
Byoung-Chul Kim
Cheol Ho Shin
Show All
Source
Cite
Save
Citations (11)
Atomic layer deposition process for forming a silicon-containing thin film
2001
Dong-chan Kim
Yeong-Kwan Suwon Kim
Joo-Won Lee
Young Wook Park
Show All
Source
Cite
Save
Citations (0)
of the same semiconductor device and process for producing
2000
Yeong-kwan Kim
Heungsoo Park
Young Wook Park
Sang In Lee
Yoon-Hee Chang
Jong-Ho Lee
Sung Je Choi
Seung-Hwan Lee
Jae Soon Lim
Joo-Won Lee
Show All
Source
Cite
Save
Citations (0)
1