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Praneetha Poloju
Praneetha Poloju
IBM
Copper
Chemical-mechanical planarization
Slurry
Metal
X-ray photoelectron spectroscopy
2
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10
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0
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2024
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Hybrid clean approach for post-copper CMP defect reduction
2013
ASMC | Advanced Semiconductor Manufacturing Conference
Wei-Tsu Tseng
Vamsi Devarapalli
James J. Steffes
Adam Ticknor
Mahmoud Khojasteh
Praneetha Poloju
Colin Goyette
David Steber
Leo Tai
Steven E. Molis
Mary Zaitz
Elliott Rill
S. Mittal
Michael Kennett
Laertis Economikos
George F. Ouimet
Christine Bunke
Connie Truong
Stephan Grunow
Michael P. Chudzik
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Citations (2)
Post Copper CMP Hybrid Clean Process for Advanced BEOL Technology
2013
IEEE Transactions on Semiconductor Manufacturing
Wei-Tsu Tseng
Vamsi Devarapalli
James J. Steffes
Adam Ticknor
Mahmoud Khojasteh
Praneetha Poloju
Colin Goyette
David Steber
Leo Tai
Steven E. Molis
Mary Zaitz
Elliott Rill
Michael Kennett
Laertis Economikos
Naftali E. Lustig
Christine Bunke
Connie Truong
Michael P. Chudzik
Stephan Grunow
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Citations (8)
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