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Masahito Tanabe
Masahito Tanabe
Resist
Materials science
Optics
Nanotechnology
Lithography
6
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4
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Characterization of a new polarity switching negative tone e-beam resist for 14nm and 10nm logic node mask fabrication and beyond
2014
Tom Faure
Amy E. Zweber
Luisa D. Bozano
Martha I. Sanchez
R. Sooriyakumaran
Linda K. Sundberg
Yoshifumi Sakamoto
Steven C. Nash
Masayuki Kagawa
Takeshi Isogawa
Tasuku Senna
Masahito Tanabe
Toru Komizo
I Yoshida
Keiichi Masunaga
Satoshi Watanabe
Yoshio Kawai
Joseph L. Malenfant
R. Bowley
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Investigation of the development process for high-precision patterning
2009
Junichi Watanabe
Tsukasa Yamazaki
Masahito Tanabe
Toru Komizo
Amy E. Zweber
Adam C. Smith
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Chemical characteristics of negative-tone chemically amplified resist for advanced mask making (II)
2004
Kazumasa Takeshi
Masahito Tanabe
Daisuke Inokuchi
Yuichi Fukushima
Yasuhiro Okumoto
Yoshimitu Okuda
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Chemical characteristics of negative-tone chemically amplified resist for advanced mask making: II
2004
Kazumasa Takeshi
Masahito Tanabe
Daisuke Inokuchi
Yuichi Fukushima
Yasuhiro Okumoto
Yoshimitsu Okuda
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