Chemical characteristics of negative-tone chemically amplified resist for advanced mask making: II

We investigated the film property and the lithographic performance of five commercialized NCARs. This report focused on Cr effect and PCD stability which are critical issues on advanced mask making. Results confirmed to solve the Cr effect by controlled dissolution rate of resist film. Furthermore, PCD was occurred by PAG moving and unsuitable reaction in the resist film standing delay time. This report suggests the strategy that was design of chemical structure for the next generation NCARs.