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T. Danz
T. Danz
Technische Universität Ilmenau
Analytical chemistry
Plasma etching
Materials science
Etching
Simulation
2
Papers
13
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Integrated plasma processing simulation framework, linking tool scale plasma models with 2D feature scale etch simulator
2009
Microelectronic Engineering
Maik Hauguth
B. Volland
Valentyn Ishchuk
D. Dressler
T. Danz
Ivo W. Rangelow
George Kokkoris
Evangelos Gogolides
Andy Goodyear
Mike Cooke
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Citations (7)
New method for the precise flux calculation of neutrals for arbitrary surfaces in profile etch simulations
2008
Microelectronic Engineering
Maik Hauguth
T. Danz
B. Volland
V. Ishshuk
D. Dreíßler
Ivo W. Rangelow
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Citations (6)
1