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Maik Hauguth
Maik Hauguth
Technische Universität Ilmenau
Analytical chemistry
Plasma etching
Materials science
Etching
Plasma
4
Papers
43
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Charging effect simulation model used in simulations of plasma etching of silicon
2012
Journal of Applied Physics
Valentyn Ishchuk
B. Volland
Maik Hauguth
Mike Cooke
Ivo W. Rangelow
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Citations (28)
Irregular film thickness distribution in C4F8 inductively coupled plasma polymer deposition
2012
Microelectronic Engineering
B. Volland
Maik Hauguth
Valentyn Ishchuk
Ivo W. Rangelow
Andrew L. Goodyear
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Citations (2)
Integrated plasma processing simulation framework, linking tool scale plasma models with 2D feature scale etch simulator
2009
Microelectronic Engineering
Maik Hauguth
B. Volland
Valentyn Ishchuk
D. Dressler
T. Danz
Ivo W. Rangelow
George Kokkoris
Evangelos Gogolides
Andy Goodyear
Mike Cooke
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Citations (7)
New method for the precise flux calculation of neutrals for arbitrary surfaces in profile etch simulations
2008
Microelectronic Engineering
Maik Hauguth
T. Danz
B. Volland
V. Ishshuk
D. Dreíßler
Ivo W. Rangelow
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Citations (6)
1