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David C. Benoit
David C. Benoit
Motorola
Metrology
Engineering
Electronic engineering
Process control
Critical dimension
4
Papers
38
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Performance study of new segmented overlay marks for advanced wafer processing
2003
Mike Adel
John A. Allgair
David C. Benoit
Mark Ghinovker
Elyakim Kassel
Chris Nelson
John C. Robinson
Gary Stanley Seligman
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Citations (14)
Overlay tool comparison for sub-130-nm technologies
2002
Beth Russo
Michael Bishop
David C. Benoit
Richard M. Silver
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Implementation of spectroscopic critical dimension (SCD) (TM) for gate CD control and stepper characterization
2001
John A. Allgair
David C. Benoit
Mark Drew
Robert R. Hershey
Lloyd C. Litt
Pedro Herrera
Umar K. Whitney
Marco Guevremont
Ady Levy
Suresh Lakkapragada
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Citations (7)
Manufacturing considerations for implementation of scatterometry for process monitoring
2000
John A. Allgair
David C. Benoit
Robert R. Hershey
Lloyd C. Litt
Ibrahim Abdulhalim
William Braymer
Michael Faeyrman
John C. Robinson
Umar K. Whitney
Yiping Xu
Piotr Zalicki
Joel L. Seligson
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Citations (15)
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