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Christian Kapteyn

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Challenges for the DRAM cell scaling to 40nm

2005 IEDM | International Electron Devices Meeting
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Manufacturing process of semiconductor structures

2005
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Verfahren zum Herstellen einer Schichtanordnung, Verfahren zum Herstellen eines elektrischen Bauelementes, Schichtanordnung und elektrisches Bauelement

2005
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Influence of gate material and stress voltage on post breakdown leakage current of high k dielectrics

2005 IRPS | International Reliability Physics Symposium
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