Old Web
English
Sign In
Acemap
>
authorDetail
>
Haruyuki Nomura
Haruyuki Nomura
Resist
Materials science
Electron-beam lithography
Lithography
Critical dimension
7
Papers
11
Citations
0
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (5)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Study on modeling of resist surface charge effect on mask blanks with charge dissipation layer in electron beam mask writers
2021
Haruyuki Nomura
Noriaki Nakayamada
Takashi Kamikubo
Reiko Nishimura
Rumi Ito
Yoshinori Kojima
Show All
Source
Cite
Save
Citations (0)
Study on physical model of resist surface charge in electron beam mask writer EBM-9500PLUS
2020
Haruyuki Nomura
Noriaki Nakayamada
Takehiko Katsumata
Rumi Ito
Yoshinori Kojima
Show All
Source
Cite
Save
Citations (0)
Electron beam lithographic modeling assisted by artificial intelligence technology
2017
Noriaki Nakayamada
Rieko Nishimura
Satoru Miura
Haruyuki Nomura
Takashi Kamikubo
Show All
Source
Cite
Save
Citations (1)
Electron beam mask writer EBM-9500 for logic 7nm node generation
2016
Hideki Matsui
Takashi Kamikubo
Satoshi Nakahashi
Haruyuki Nomura
Noriaki Nakayamada
Mizuna Suganuma
Yasuo Kato
Jun Yashima
Victor Katsap
Kenichi Saito
Ryoei Kobayashi
Nobuo Miyamoto
Munehiro Ogasawara
Show All
Source
Cite
Save
Citations (3)
Study on modeling of resist heating effect correction in EB mask writer EBM-9000
2015
Haruyuki Nomura
Takashi Kamikubo
Mizuna Suganuma
Yasuo Kato
Jun Yashima
Noriaki Nakayamada
Hirohito Anze
Munehiro Ogasawara
Show All
Source
Cite
Save
Citations (2)
1