Study on modeling of resist surface charge effect on mask blanks with charge dissipation layer in electron beam mask writers

In this paper, we will report the modeling of behaviors of low-energy secondary electrons (LSEs) in a charge effect correction system (CEC), which compensates image placement errors predicted by writing layout data, on mask blanks with and without a charge dissipation layer (CDL). For the demand of low line edge roughness and high critical dimension uniformity, the more dose-sensitivity of resist is lowered, the more a contribution of LSE is made in charge effect, because the number of primary electrons generating LSEs also increases. In such a situation of advanced lithography, we have tackled challenges of CEC system in terms of blanks with and without CDL. On blanks without CDL, CEC needs to predict the complicated charge distribution including that of LSE which is affected by electromagnetic field of optical system and already-existing resist surface charge. On blanks with CDL, CEC needs to predict LSE charge diffusing on the resist surface. In order to address these challenges, NuFlare Technology (NFT) has developed models of CEC on blanks with and without CDL. In order to verify these models, we evaluated the surface charge effect in the writing on blanks with resist of 100 μC/cm2 dose-sensitivity on electron beam mask writer EBM-9000/9500. Furthermore, as another solution besides CEC and CDL, NFT has developed a charge effect reduction (CER) system which prevents LSEs from re-entering into the resist surface. We have verified CER by comparing the experimental results between EBM9500 and EBM9500PLUS, which is the NFT’s latest variable-shaped beam with CER system.