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H. H. Ji
H. H. Ji
Materials science
Thermal stability
Boron
Radiochemistry
Analytical chemistry
2
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1
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0
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Formation and Thermal Stability Characteristics of Ni Silicide on Boron Cluster (B>inf /inf inf /inf<) Implanted Source/Drain
2006
IWJT | International Workshop on Junction Technology
W.J. Lee
S. Y. Oh
Y. J. Kim
Y. Y. Zhang
Z. Zhong
S. Y. Jung
H. H. Ji
K. J. Hwang
Y.C. Kim
H.T. Cho
W.A. Knull
J.-S. Wang
H. D. Lee
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Formation Temperature Dependence of Thermal Stability of Nickel Silicide with Ni-V Alloy for Nanoscale MOSFETs
2005
A. Tuya
S. Y. Oh
J G Yun
Y. J. Kim
W.J. Lee
H. H. Ji
Y. Y. Zhang
Z. Zhong
H. D. Lee
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