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Hyo-Chang Lee

Korea Research Institute of Standards and Science

11

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78

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Characteristics of SiO2 Etching by Capacitively Coupled Plasma with Different Fluorocarbon Liquids (C7F14, C7F8) and Fluorocarbon Gas (C4F8)

2021 Applied Science and Convergence Technology
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Flat cutoff probe for real-time electron density measurement in industrial plasma processing

2019 Plasma Sources Science and Technology
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A Brief Review of Electron Kinetics in Radio-Frequency Plasmas

2019 Applied Science and Convergence Technology
- Hyo-Chang Lee
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Characterization of particle generated during plasma-enhanced chemical vapor deposition on amorphous carbon layer using particle beam mass spectrometer

2018 Journal of Vacuum Science and Technology
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Review of inductively coupled plasmas: Nano-applications and bistable hysteresis physics

2018 Applied physics reviews
- Hyo-Chang Lee
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Citations (42)