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H J Yeom
H J Yeom
Korea Research Institute of Standards and Science
Plasma
Inductively coupled plasma
Physics
Electron density
Wafer
8
Papers
23
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A comprehenssive study on the discharge physics and atomic layer etching with radio frequency biased inductively coupled plasma in Ar/C 4 F 6 mixture
2021
Bulletin of the American Physical Society
Min-Young Yoon
H J Yeom
Jung Hyung Kim
Chegal Won
Yong Jai Cho
Deuk-Chul Kwon
Jong-Ryul Jeong
Hyo-Chang Lee
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Plasma density measurement and downstream etching of silicon and silicon oxide in Ar/NF_3 mixture remote plasma source
2019
Plasma Science & Technology
H J Yeom
D H Choi
Y.-S. Lee
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Flat cutoff probe for real-time electron density measurement in industrial plasma processing
2019
Plasma Sources Science and Technology
H J Yeom
J.-H. Kim
D H Choi
E S Choi
M Y Yoon
D.-J. Seong
Shin Jae You
Hyo-Chang Lee
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Citations (5)
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