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Jee-Suk Hong
Jee-Suk Hong
Lithography
Engineering
Optics
Photolithography
Phase-shift mask
4
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3
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Study on the potentialities of sub-100nm optical lithography of alternating and phase-edge phase shift mask for ArF lithography
2001
Sang-Sool Koo
Hee-Bom Kim
Hyoung-Soon Yune
Jee-Suk Hong
Seung-Weon Paek
Tae-Seung Eom
Chang-Nam Ahn
Young-Mog Ham
Ki-Ho Baik
Kyu-Yong Lee
Lee-Ju Kim
Hong-Seok Kim
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Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography
2001
Sang-Sool Koo
Hee-Bom Kim
Hyoung-Soon Yune
Jee-Suk Hong
Seung-Weon Paek
Tae-Seung Eom
Chang-Nam Ahn
Young-Mog Ham
Ki-Ho Baik
Kyu-Yong Lee
Lee-Ju Kim
Hong-Seok Kim
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Accuracy of diffused aerial image model for full-chip-level optical proximity correction
2000
Jee-Suk Hong
Hee-Bom Kim
Hyoung-Soon Yune
Chang-Nam Ahn
Youngmo Koo
Ki-Ho Baik
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Citations (3)
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