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Thorston Lill
Thorston Lill
Applied Materials
Plasma
Electronic engineering
Atomic physics
Physics
RF power amplifier
4
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12
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Characteristics of VHF Capacitively Coupled Plasmas in a 300 mm Etch Chamber
2005
ICOPS | International Conference on Plasma Science
G. A. Hebner
P. A. Miller
Edward V. Barnat
Alex Paterson
John Holland
Thorston Lill
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Frequency dependent spatial distributions of the electrons in a 300 mm diameter VHF capacitively coupled plasmas
2005
Bulletin of the American Physical Society
Greg Hebner
E. V. Barnat
Paul Miller
Alex Paterson
John Holland
Thorston Lill
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Potentials and fields in a 300-mm dual-frequency reactor.
2004
Gregory Albert Hebner
Thorston Lill
John Holland
Alex Paterson
Edward V. Barnat
P. A. Miller
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Generating sub-30-nm polysilicon gates using PECVD amorphous carbon as hardmask and anti-reflective coating
2003
Wei Liu
David Mui
Thorston Lill
May Dongmei Wang
Christopher Dennis Bencher
Michael Kwan
Wendy H. Yeh
Takeaki Ebihara
Toshihiro Oga
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